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| Editorial Board |
| Reviewers |
| Focus and Scope |
| Publication Ethics |
| Author Guidelines |
| Peer Review Process |
| Open Access Policy |
| Copyright Notice |
| Article Processing Charge (APC) |
| Screening For Plagiarism Policy |

Jurnal Lex Technologia is licensed under a Creative Commons Attribution-ShareAlike 4.0 International License.
Published by Bifla Solusi and Fakultas Ilmu Sosial dan Hukum, Universitas Negeri Manado, North Sulawesi, Indonesia