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| Editorial Board |
| Reviewers |
| Focus and Scope |
| Publication Ethics |
| Author Guidelines |
| Peer Review Process |
| Open Access Policy |
| Copyright Notice |
| Article Processing Charge (APC) |
| Screening For Plagiarism Policy |
Lex Technologia: Jurnal Hukum dan Masyarakat Digital is firmly committed to upholding academic integrity, originality, and ethical publishing practices in all submitted and published manuscripts. To maintain these standards, every manuscript submitted to the journal is subject to a plagiarism screening process prior to entering the peer-review stage. The journal utilizes reputable plagiarism detection software to identify potential textual similarities, overlaps, or unoriginal content. Manuscripts found to contain plagiarism, self-plagiarism, data fabrication, falsification, or other forms of academic misconduct will be rejected immediately. In cases where minor similarity is detected and deemed unintentional, authors may be requested to revise and resubmit their manuscripts. However, serious ethical violations will result in automatic rejection without further editorial consideration.
The acceptable similarity index for submitted manuscripts is below 20%, excluding references, properly cited quotations, tables of contents, and commonly used academic expressions. Authors bear full responsibility for ensuring that their work respects intellectual property rights and that all sources are appropriately cited in accordance with established academic standards. Through the implementation of this plagiarism screening policy, Lex Technologia: Jurnal Hukum dan Masyarakat Digital seeks to uphold ethical excellence and scholarly credibility, ensuring that every published article represents an original, rigorous, and meaningful contribution to human interaction studies, social research, and interdisciplinary scholarship at both national and international levels.
| Editorial Board |
| Reviewers |
| Focus and Scope |
| Publication Ethics |
| Author Guidelines |
| Peer Review Process |
| Open Access Policy |
| Copyright Notice |
| Article Processing Charge (APC) |
| Screening For Plagiarism Policy |

Jurnal Lex Technologia is licensed under a Creative Commons Attribution-ShareAlike 4.0 International License.
Published by Bifla Solusi and Fakultas Ilmu Sosial dan Hukum, Universitas Negeri Manado, North Sulawesi, Indonesia