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| Editorial Board |
| Reviewers |
| Focus and Scope |
| Publication Ethics |
| Author Guidelines |
| Peer Review Process |
| Open Access Policy |
| Copyright Notice |
| Article Processing Charge (APC) |
| Screening For Plagiarism Policy |
| Journal Title | : | Jurnal Hukum dan Masyarakat Digital |
| Initial | : | Lex Technologia |
| Frequency | : | 3 Times Per Year (April, August, December) |
| DOI | : | - |
| Online ISSN | : | - |
| Editor in Chief | : | Dr. Wenly R. J. Lolong, S.H., M.H |
| Managing Editor | : | Dr. Wenly R. J. Lolong, S.H., M.H |
| Publisher | : |
Bifla Solusi dan Fakultas Ilmu Sosial & Hukum Universitas Negeri Manado |
Lex Technologia: Jurnal Hukum dan Masyarakat Digital is a multidisciplinary academic platform that focuses on issues related to law, information technology, and the social sciences and humanities in the digital era. This journal serves as a scholarly forum to address global challenges in regulating, organizing, and guiding society toward a digital transformation that is just, transparent, and ethically grounded.
The scope of published research includes, but is not limited to:
· Legal regulations and public policy in the digital era;
· Information technology, big data, artificial intelligence, and their implications for law and society;
· Cyber law, cybersecurity, and personal data protection;
· Social transformation, digital culture, ethics, and the philosophy of technology;
· Interdisciplinary studies across law, technology, and the humanities.
The vision of this journal is to become a leading reference in the study of law and digital society at both national and international levels. Its mission is to promote interdisciplinary academic collaboration, enhance digital legal literacy, and strengthen legal capacity in responding to technological and social changes.
| Editorial Board |
| Reviewers |
| Focus and Scope |
| Publication Ethics |
| Author Guidelines |
| Peer Review Process |
| Open Access Policy |
| Copyright Notice |
| Article Processing Charge (APC) |
| Screening For Plagiarism Policy |

Jurnal Lex Technologia is licensed under a Creative Commons Attribution-ShareAlike 4.0 International License.
Published by Bifla Solusi and Fakultas Ilmu Sosial dan Hukum, Universitas Negeri Manado, North Sulawesi, Indonesia